Low Pressure Chemical Vapor Deposition of a-Si:H from Disilane. For Thin Film Solar Cells

Low Pressure Chemical Vapor Deposition of a-Si:H from Disilane. For Thin Film Solar Cells

Cole Petersburg, Vikram Dalal

     

бумажная книга



Издательство: Книга по требованию
Дата выхода: июль 2011
ISBN: 978-3-6390-6932-7
Объём: 80 страниц
Масса: 141 г
Размеры(В x Ш x Т), см: 23 x 16 x 1

Our sun's boundless power can, and should, supply a large portion of our energy needs. Thin film solar cells are flexible and relatively cheap, making it possible for us to cover our infrastructure, vehicles, and military tents with non-polluting, decentralized power generation. Such cells are commerically available and are produced by Powerfilm, Inc. in Iowa in the form of wide, polymer-backed rolls. This is made possible by plasma-enhanced chemical vapor deposition. Still, electrical plasmas, and the equipment required to generate them, are complex. In this work, a simpler method requiring only heat and pressure is investigated. Good quality hydogenated, amorphous silicon was deposited at high rates by the use of disilane instead of monosilane. A few pitfalls were identified along the way.

Данное издание не является оригинальным. Книга печатается по технологии принт-он-деманд после получения заказа.

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